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System and methods for plasma application

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专利名称:System and methods for plasma application发明人:Il-Gyo Koo,Cameron A. Moore,George J.

Collins,Jin-Hoon Cho

申请号:US14669028申请日:20150326公开号:US09287091B2公开日:20160315

专利附图:

摘要:A plasma system includes a plasma device, an ionizable media source, and apower source. The plasma device includes an inner electrode and an outer electrodecoaxially disposed around the inner electrode. The inner electrode includes a distal

portion and an insulative layer that covers at least a portion of the inner electrode. Theionizable media source is coupled to the plasma device and is configured to supplyionizable media thereto. The power source is coupled to the inner and outer electrodes,and is configured to ignite the ionizable media at the plasma device to form a plasmaeffluent having an electron sheath layer about the exposed distal portion.

申请人:COLORADO STATE UNIVERSITY RESEARCH FOUNDATION

地址:Fort Collins CO US

国籍:US

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