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专利名称：OPTICAL PROXIMITY CORRECTION
METHOD AND SYSTEM
发明人：Jinyin Wan,Jinheng Wang,Lei Zhang,Jie Chen申请号：US15756799申请日：20160511
公开号：US20180252996A1公开日：20180906
专利附图：
摘要：An optical proximity correction method, comprising: dissecting an edge of adesign pattern () to form a segment (Seg/Seg); setting target points of the segments(Seg/Seg), and if the segments (Seg/Seg) translate in a direction vertical to the segments
(Seg/Seg), controlling tangent points (P/P) of the segments (Seg/Seg) tangent to asimulated pattern () to coincide with the target points; computing edge positiondifferences of the target points; and correcting the design pattern () according to theedge position differences.
申请人：CSMC TECHNOLOGIES FAB2 CO., LTD.
地址：Wuxi New District CN
国籍：CN
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