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专利名称：Method and Lithography Device with a Mask
Reflecting Light
发明人：Hans-Jürgen MANN,Martin
Lowisch,Wolfgang Singer
申请号：US13073629申请日：20110328
公开号：US20110229827A1公开日：20110922
专利附图：
摘要：A method and lithography device addressing the problem in projection opticsof pupil apodization which leads to imaging defects. As here proposed, the illumination
system is configured to illuminate the mask inhomogeneously. As a result,
inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted.This compensation not only makes the apodization over the pupil become moresymmetric but also makes the intensity variation smaller overall.
申请人：Hans-Jürgen MANN,Martin Lowisch,Wolfgang Singer
地址：Oberkochen DE,Oberkochen DE,Aalen DE
国籍：DE,DE,DE
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