专利内容由知识产权出版社提供
专利名称：MULTILAYER FILM REFLECTOR, METHOD OF
MANUFACTURING MULTILAYER FILMREFLECTOR, PROJECTION OPTICAL SYSTEM,EXPOSURE APPARATUS, AND METHOD OFMANUFACTURING DEVICE
发明人：Noriaki KANDAKA,Katsuhiko MURAKAMI申请号：US14988141申请日：20160105
公开号：US20160246178A1公开日：20160825
专利附图：
摘要：A multilayer film reflector is a multilayer film reflector that includes a firstuniform period multilayer film, an adjustment layer, and a second uniform periodmultilayer film in this order from a substrate side. A combination of the following (a) to(c) is set to each region or each position within a reflection surface. (a) Reflectioncharacteristics of the single first uniform period multilayer film, (b) reflection
characteristics of the single second uniform period multilayer film, and (c) a film thicknessof the adjustment layer.
申请人：NIKON CORPORATION
地址：Tokyo JP
国籍：JP
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