专利内容由知识产权出版社提供
专利名称：Exposure apparatus and making method
thereof
发明人：Akimitsu Ebihara申请号：US1199申请日：20061228
公开号：US20070206170A1公开日：20070906
专利附图：
摘要：An exposure apparatus that forms a pattern by exposing a substrate isequipped with a first platform tower, a second platform tower installed at apredetermined distance, and an exposure main section arranged within the space
between both platform towers that includes a plurality of high rigidity sections eachincluding a high rigidity component. Accordingly, it becomes possible to use a module (ahigh rigidity section) of the preceding generation even when the generation changes.
申请人：Akimitsu Ebihara
地址：Fukaya-shi JP
国籍：JP
更多信息请下载全文后查看
