专利内容由知识产权出版社提供
专利名称：INTERFEROMETRIC ANALYSIS FOR THE
MANUFACTURE OF NANO-SCALE DEVICES
发明人：NIMMAKAYALA, Pawan K.,RAFFERTY, Tom
H.,AGHILI, Alireza,CHOI, Byung-Jin,SCHUMAKER, Philip, D.,BABBS, Daniel,A.,TRUSKETT, Van, N.
申请号：EP05858633.0申请日：20051121公开号：EP1817545B1公开日：20170809
摘要：The present invention features a system to determine relative spatialparameters between two coordinate systems, which may be a mold and a region of asubstrate in which mold is employed to generate a pattern. The system senses relativealignment between the two coordinate systems at multiple points and determinesrelative spatial parameters therebetween. The relative spatial parameters include arelative area and a relative shape.
申请人：CANON NANOTECHNOLOGIES INC,MOLECULAR IMPRINTS INC
地址：US,US
国籍：US,US
代理机构：Ponzellini, Gianmarco
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