专利内容由知识产权出版社提供
专利名称：Analytical method and apparatus发明人：Bengt Ivarsson申请号：US11482501申请日：20060707公开号：US07262866B2公开日：20070828
专利附图：
摘要：A method of examining thin layer structures on a surface for differences inrespect of optical thickness, which method comprises the steps of: irradiating the surfacewith light so that the light is internally or externally reflected at the surface; imaging thereflected light on a first two-dimensional detector; sequentially or continuously scanning
the incident angle and/or wavelength of the light over an angular and/or wavelengthrange; measuring the intensities of light reflected from different parts of the surface andimpinging on different parts of the detector, at at least a number of incident anglesand/or wavelengths, the intensity of light reflected from each part of the surface foreach angle and/or wavelength depending on the optical thickness of the thin layerstructure thereon; and determining from the detected light intensities at the differentlight incident angles and/or wavelengths an optical thickness image of the thin layerstructures on the surface. According to the invention, part of the light reflected at saidsurface is detected on a second detector to determine the incident angle or wavelengthof the polarized light irradiating the surface. An apparatus for carrying out the method isalso disclosed.
申请人：Bengt Ivarsson
地址：Bälinge SE
国籍：SE
代理人：Dwayne L. Bentley,Yonggang Ji
更多信息请下载全文后查看
